White paper

Assess and optimize cleaning efficiency

- Using QSense QCM-D to analyze cleaning process dynamics, surface etching, and surface residual

The development and optimization of cleaning formulations and protocols require detailed insights into the interactions between cleaning agents, target soils, and surfaces under given conditions such as pH and temperature. Traditional analysis methods, which often focus on before-and-after assessments, lack the capability to provide time-resolved mechanistic information on the cleaning process. This limitation can obscure the path to achieving desired product performance. QSense® QCM-D technology addresses this challenge by offering time-resolved, nanoscale analysis of detergent activity and cleaning dynamics. 

In this white paper, we present three case examples demonstrating the application of QCM-D technology in 1) assessing cleaning process dynamics, 2) surface etching, and 3) residual analysis. The results highlight how QCM-D can guide product design and development efficiently, reducing time and risk while ensuring optimal performance.

Cleaning technical whitepaper

 


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